ausblenden:
Schlagwörter:
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MPIPKS:
Stochastic processes
Zusammenfassung:
Starting from a continuum description, We study the nonequilibrium roughening of a thermal re-emission model for etching in one and two spatial dimensions. Using standard analytical techniques, we map our problem to a generalized version of an earlier nonlocal KPZ (Kardar-Parisi-Zhang) model. In 2 + 1 dimensions, the values of the roughness and the dynamic exponents calculated from our theory go like alphaapproximate tozapproximate to1 and in 1 + 1 dimensions, the exponents resemble the KPZ values for low vapor pressure, supporting experimental results. Interestingly. Galilean invariance is maintained throughout.
