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  Preferential sputtering induced Cr-Diffusion during plasma exposure of WCrY smart alloys

Schmitz, J., Mutzke, A., Litnovsky, A., Klein, F., Tan, X. Y., Wegener, T., et al. (2019). Preferential sputtering induced Cr-Diffusion during plasma exposure of WCrY smart alloys. Journal of Nuclear Materials, 526: 151767. doi:10.1016/j.jnucmat.2019.151767.

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Item Permalink: https://hdl.handle.net/21.11116/0000-0004-CCD0-B Version Permalink: https://hdl.handle.net/21.11116/0000-0007-05B6-6
Genre: Journal Article

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https://doi.org/10.1016/j.jnucmat.2019.151767 (Publisher version)
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 Creators:
Schmitz, J.1, Author
Mutzke, A.2, Author           
Litnovsky, A.1, Author
Klein, F.1, Author
Tan, X. Y.1, Author
Wegener, T.1, Author
Hansen, P.1, Author
Aghdassi, N.1, Author
Eksaeva, A.1, Author
Rasinski, M.1, Author
Kreter, A.1, Author
Gonzalez-Julian, J.1, Author
Coenen, J. W.1, Author
Linsmeier, Ch.1, Author
Bram, M.1, Author
Affiliations:
1External Organizations, ou_persistent22              
2Stellarator Theory (ST), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856287              

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Language(s): eng - English
 Dates: 20192019
 Publication Status: Issued
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: DOI: 10.1016/j.jnucmat.2019.151767
 Degree: -

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Project name : Euratom Research and Training Programme 2014-2018 and 2019-2020 – EUROfusion
Grant ID : 633053
Funding program : Horizon 2020 (H2020)
Funding organization : European Commission (EC)

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Title: Journal of Nuclear Materials
  Abbreviation : J. Nucl. Mater.
Source Genre: Journal
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Publ. Info: Amsterdam : Elsevier B.V.
Pages: - Volume / Issue: 526 Sequence Number: 151767 Start / End Page: - Identifier: ISSN: 0022-3115
CoNE: https://pure.mpg.de/cone/journals/resource/954925416962