Mechanisms of interdiffusion in Pd-Cu thin film diffusion couples

Chakraborty, J.; Welzel, U.; Mittemeijer, E. J.

doi:10.1016/j.tsf.2009.08.026

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Mechanisms of interdiffusion in Pd-Cu thin film diffusion couples

Chakraborty, J., Welzel, U., & Mittemeijer, E. J. (2010). Mechanisms of interdiffusion in Pd-Cu thin film diffusion couples. Thin Solid Films, 518, 2010-2020. doi:10.1016/j.tsf.2009.08.026.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-3B56-A Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-3B57-8

Genre: Journal Article

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Creators:
Chakraborty, J.¹, Author
Welzel, U.¹, Author
Mittemeijer, E. J.^{1, 2}, Author

Affiliations:
1Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497644
2Universität Stuttgart, Institut für Materialwissenschaft, ou_persistent22

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Free keywords: MPI für Metallforschung; Abt. Mittemeijer;

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Language(s): eng - English

Dates: Date issued: 2010

Publication Status: Issued

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Rev. Type: Peer

Identifiers: eDoc: 452084
DOI: 10.1016/j.tsf.2009.08.026

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Title: Thin Solid Films

Source Genre: Journal

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Pages: - Volume / Issue: 518 Sequence Number: - Start / End Page: 2010 - 2020 Identifier: -