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  Strongly enhanced thermal stability of crystalline organic thin films induced by aluminium oxide capping layers

Sellner, S., Gerlach, A., Schreiber, F., Kelsch, M., Kasper, N., Dosch, H., et al. (2004). Strongly enhanced thermal stability of crystalline organic thin films induced by aluminium oxide capping layers. Advanced Materials, 16, 1750-1753.

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 Creators:
Sellner, S.1, Author           
Gerlach, A.2, Author
Schreiber, F.3, Author           
Kelsch, M.4, 5, Author           
Kasper, N.1, Author           
Dosch, H.1, 6, Author           
Meyer, S.2, Author
Pflaum, J.2, Author
Fischer, M.2, Author
Gompf, B.2, Author
Affiliations:
1Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497645              
2Physical and Theoretical Chemistry Laboratory, Oxford University, Oxford, UK;III. Physikalisches Institut, Universität Stuttgart, Stuttgart, Germany;I. Physikalisches Institut, Universität Stuttgart, Stuttgart, Germany, ou_persistent22              
3Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497644              
4Former Dept. Microstructure Interfaces, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497657              
5Stuttgart Center for Electron Microscopy, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497669              
6Universität Stuttgart, Institut für Theoretische und Angewandte Physik, ou_persistent22              

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Free keywords: MPI für Metallforschung; MPI für Metallforschung; Abt. Dosch; Abt. Dosch; Abt. Rühle; ZWE MF-ANKA-Beamline; ZWE Hochspannungs-Mikroskopie;
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Language(s): eng - English
 Dates: 2004
 Publication Status: Issued
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: eDoc: 204840
 Degree: -

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Title: Advanced Materials
Source Genre: Journal
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Pages: - Volume / Issue: 16 Sequence Number: - Start / End Page: 1750 - 1753 Identifier: -