Ion-induced surface activation, chemical sputtering, and hydrogen release 
during plasma-assisted hydrocarbon film growth

Hopf, C.; Jacob, W.; von Keudell, A.

doi:10.1063/1.1883729

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Ion-induced surface activation, chemical sputtering, and hydrogen release during plasma-assisted hydrocarbon film growth

Hopf, C., Jacob, W., & von Keudell, A. (2005). Ion-induced surface activation, chemical sputtering, and hydrogen release during plasma-assisted hydrocarbon film growth. Journal of Applied Physics, 97: 094904. doi:10.1063/1.1883729.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-1471-5 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-1472-3

Genre: Journal Article

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Creators:
Hopf, C.^{1, 2}, Author
Jacob, W.^{1, 2}, Author
von Keudell, A.³, Author

Affiliations:
1Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288
2Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856328
3External Organizations, ou_persistent22

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Language(s): eng - English

Dates: Date issued: 2005

Publication Status: Issued

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Rev. Type: Peer

Identifiers: eDoc: 126350
DOI: 10.1063/1.1883729

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Title: Journal of Applied Physics

Alternative Title : J. Appl. Phys.

Source Genre: Journal

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Pages: - Volume / Issue: 97 Sequence Number: 094904 Start / End Page: - Identifier: -