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  Ion beam analysis of rough thin films

Mayer, M. (2002). Ion beam analysis of rough thin films. Nuclear Instruments and Methods in Physics Research B: Beam Interactions with Materials and Atoms, 194(2), 177-186.

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 Creators:
Mayer, M.1, Author           
Affiliations:
1Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856328              

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 Abstract: The influence of surface roughness on Rutherford backscattering spectroscopy (RBS) spectra has been studied experimentally and by computer simulation with the SIMNRA code. Rough thin films are described by a distribution of film thicknesses, while rough substrates are approximated by a distribution of local inclination angles. Correlation effects of surface roughness are neglected. Rough film effects can be calculated for RBS including non-Rutherford scattering, nuclear reaction analysis and elastic recoil detection analysis. The results of simulation calculations show good agreement with experimental data. For thin films of high Z elements on rough substrates additionally plural scattering plays an important role. (C) 2002 Elsevier Science B.V. All rights reserved.

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Language(s): eng - English
 Dates: 2002-08
 Publication Status: Issued
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 Rev. Type: Peer
 Identifiers: eDoc: 21029
ISI: 000177450200010
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Title: Nuclear Instruments and Methods in Physics Research B: Beam Interactions with Materials and Atoms
  Alternative Title : Nucl. Instrum. Methods Phys. Res. B
Source Genre: Journal
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Pages: - Volume / Issue: 194 (2) Sequence Number: - Start / End Page: 177 - 186 Identifier: ISSN: 0168-583X