Metalorganic chemical vapor deposition of silver thin films for future 
interconnects by direct liquid injection system

Yoon, J.-S.; Fischer, R.; Gori, S.; Knauer, J.

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Metalorganic chemical vapor deposition of silver thin films for future interconnects by direct liquid injection system

Yoon, J.-S., Fischer, R., Gori, S., & Knauer, J. (2004). Metalorganic chemical vapor deposition of silver thin films for future interconnects by direct liquid injection system. Journal of the Korean Physical Society, 6, 1544-1552.

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Datensatz-Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-20E8-F Versions-Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-20E9-D

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Urheber:
Yoon, J.-S.¹, Autor
Fischer, R.^{2, 3}, Autor
Gori, S.^{2, 3}, Autor
Knauer, J.⁴, Autor

Affiliations:
1Korea Basic Sci Inst, Natl Fus R&D Ctr, Taejon, 305806 South Korea; Ctr Interdisciplinary Plasma Science, Garching, D-85748 Germany, ou_persistent22
2Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society, ou_2074325
3Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288
4W7-X: Project Coordination (PC), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856303