Original and sputtering induced interface roughness in AES sputter depth 
profiling of SiO2/Ta2O5 multilayers

Rar, A.; Kojima, I.; Moon, D.W.; Hofmann, S.

Local TagsRelease HistoryDetailsSummary

Original and sputtering induced interface roughness in AES sputter depth profiling of SiO₂/Ta₂O₅ multilayers

Rar, A., Kojima, I., Moon, D., & Hofmann, S. (1999). Original and sputtering induced interface roughness in AES sputter depth profiling of SiO₂/Ta₂O₅ multilayers. Thin Solid Films, 355-356, 390-394.

Item is Released

show all hide all

Basic

show hide

Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-3A37-9 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-3A38-7

Genre: Journal Article

Files

show Files

Locators

show

Creators

show

hide

Creators:
Rar, A., Author
Kojima, I., Author
Moon, D.W., Author
Hofmann, S.¹, Author

Affiliations:
1Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497644

Content

show

hide

Free keywords: MPI für Metallforschung; Abt. Mittemeijer;

Abstract: -

Details

show

hide

Language(s): eng - English

Dates: Date issued: 1999

Publication Status: Issued

Pages: -

Publishing info: -

Table of Contents: -

Rev. Type: -

Identifiers: eDoc: 232698

Degree: -

Event

show

Legal Case

show

Project information

show

Source 1

show

hide

Title: Thin Solid Films

Source Genre: Journal

Creator(s):

Affiliations:

Publ. Info: -

Pages: - Volume / Issue: 355-356 Sequence Number: - Start / End Page: 390 - 394 Identifier: -