Optimizing Photo Mask Layout for Grey‐tone Lithography

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Optimizing Photo Mask Layout for Grey‐tone Lithography

Hopf, J.(1996). Optimizing Photo Mask Layout for Grey‐tone Lithography (140). IBFI GmbH, Schloss Dagstuhl, D‐66687 Wadern, Germany: IBFI.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0023-C685-F Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0023-C686-D

Genre: Report

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Creators:
Hopf, Jörn¹, Author
Claus, Volker², Editor
Schwefel, Hans‐Paul², Editor

Affiliations:
1Programming Logics, MPI for Informatics, Max Planck Society, ou_40045
2External Organizations, ou_persistent22

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Language(s): eng - English

Dates: Date issued: 1996

Publication Status: Issued

Pages: -

Publishing info: IBFI GmbH, Schloss Dagstuhl, D‐66687 Wadern, Germany : IBFI

Table of Contents: -

Rev. Type: -

Identifiers: Report Nr.: 140
BibTex Citekey: Hopf96b

Degree: -

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Title: Dagstuhl-Seminar-Report

Source Genre: Series

Creator(s):

Affiliations:

Publ. Info: -

Pages: - Volume / Issue: - Sequence Number: - Start / End Page: - Identifier: ISSN: 0940‐1121