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  Near-surface ion distribution and buffer effects during electrochemical reactions

Auinger, M., Katsounaros, I., Meier, J. C., Klemm, S. O., Biedermann, P. U., Topalov, A. A., et al. (2011). Near-surface ion distribution and buffer effects during electrochemical reactions. Physical Chemistry Chemical Physics, 13(36), 16384-16394. doi:10.1039/c1cp21717h.

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 Creators:
Auinger, Michael1, 2, Author           
Katsounaros, Ioannis3, Author           
Meier, Josef Christian3, Author           
Klemm, Sebasian Oliver3, Author           
Biedermann, Paul Ulrich4, Author           
Topalov, Angel Angelov3, Author           
Rohwerder, Michael1, 2, Author           
Mayrhofer, Karl Johann Jakob3, Author           
Affiliations:
1Christian Doppler Laboratory for Diffusion and Segregation Mechanisms, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863352              
2Molecular Structure and Surface Modification, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863360              
3Electrocatalysis, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863354              
4Atomistic Modelling, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863350              

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Language(s): eng - English
 Dates: 2011-09-28
 Publication Status: Issued
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: -
 Identifiers: eDoc: 571576
DOI: 10.1039/c1cp21717h
 Degree: -

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Title: Physical Chemistry Chemical Physics
  Abbreviation : Phys. Chem. Chem. Phys.
Source Genre: Journal
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Affiliations:
Publ. Info: Cambridge, England : Royal Society of Chemistry
Pages: - Volume / Issue: 13 (36) Sequence Number: - Start / End Page: 16384 - 16394 Identifier: ISSN: 1463-9076
CoNE: https://pure.mpg.de/cone/journals/resource/954925272413_1