Laser photodetachment on a high power, low pressure rf-driven negative hydrogen 
ion source

Christ-Koch, S.; Fantz, U.; Berger, M.; NBI Team

doi:10.1088/0963-0252/18/2/025003

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Laser photodetachment on a high power, low pressure rf-driven negative hydrogen ion source

Christ-Koch, S., Fantz, U., Berger, M., & NBI Team (2009). Laser photodetachment on a high power, low pressure rf-driven negative hydrogen ion source. Plasma Sources Science and Technology, 18: 025003 (12pp). doi:10.1088/0963-0252/18/2/025003.

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Datensatz-Permalink: https://hdl.handle.net/11858/00-001M-0000-0026-F383-9 Versions-Permalink: https://hdl.handle.net/11858/00-001M-0000-0026-F384-7

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Urheber:
Christ-Koch, S.¹, Autor
Fantz, U.², Autor
Berger, M.¹, Autor
NBI Team, Autor

Affiliations:
1Technology (TE), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856318
2Tokamak Scenario Development (E1), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856321