Age hardening in (Ti1 − xAlx)B2 + Δ thin films

Mockute, Aurelija; Palisaitis, Justinas; Alling, Björn; Berastegui, Pedro; Broitman, Esteban; Näslund, Lars Åke; Nedfors, Nils; Lu, Jun; Jensen, Jens M.; Hultman, Lars; Patscheider, Joerg; Jansson, Ulf; Persson, Per Ola Åke; Rosén, Johanna A.

doi:10.1016/j.scriptamat.2016.09.021

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Age hardening in (Ti_{1 − x}Al_x)B_{2 + Δ} thin films

Mockute, A., Palisaitis, J., Alling, B., Berastegui, P., Broitman, E., Näslund, L. Å., et al. (2017). Age hardening in (Ti_{1 − x}Al_x)B_{2 + Δ} thin films. Scripta Materialia, 127, 122-126. doi:10.1016/j.scriptamat.2016.09.021.

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Item Permalink: https://hdl.handle.net/21.11116/0000-0001-714A-D Version Permalink: https://hdl.handle.net/21.11116/0000-0001-7157-E

Genre: Journal Article

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Creators:
Mockute, Aurelija¹, Author
Palisaitis, Justinas¹, Author
Alling, Björn^{2, 3}, Author
Berastegui, Pedro⁴, Author
Broitman, Esteban¹, Author
Näslund, Lars Åke¹, Author
Nedfors, Nils¹, Author
Lu, Jun⁵, Author
Jensen, Jens M.³, Author
Hultman, Lars³, Author
Patscheider, Joerg⁶, Author
Jansson, Ulf⁴, Author
Persson, Per Ola Åke¹, Author
Rosén, Johanna A.¹, Author

Affiliations:
1Thin Film Physics Division, Department of Physics, Chemistry, and Biology (IFM), Linköping University, Linköping, Sweden, persistent22
2Adaptive Structural Materials (Simulation), Computational Materials Design, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863339
3Department of Physics, Chemistry and Biology (IFM), Thin Film Physics Division, Linköping University, Linköping, Sweden, ou_persistent22
4Department of Materials Chemistry, Ångström Laboratory, Uppsala University, P.O. Box 583, Uppsala, Sweden, persistent22
5Department of Physics Chemistry, and Biology (IFM), Linköping University, Linköping, Sweden, persistent22
6Laboratory of Nanoscale Materials Science, Empa, Überlandstr. 129, 8600 Dübendorf, Switzerland, ou_persistent22

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Free keywords: Aluminum; Annealing; Hardening; Hardness; Mechanical properties; Phase separation; Thin films, Annealed state; B matrixes; Columnar microstructures; Grain interiors; Hardness and elastic modulus; High hardness; Post deposition annealing; Titanium diboride, Age hardening

Abstract: Thin films of (Ti0.71Al0.29)B2 + 1.08 have been deposited by magnetron sputtering. Post-deposition annealing at 1000 °C for 1 h results in increased hardness and elastic modulus, from 32 to 37 GPa and from 436 to 461 GPa, respectively. In both as-deposited and annealed states the films adhere well to the substrate, indicating no considerable internal stress. The initial high hardness is attributed to a columnar microstructure consisting of crystalline (Ti,Al)B2 columns separated by an amorphous B matrix. The observed age hardening corresponds to phase separation within the (Ti,Al)B2 columns including the formation of Ti-deficient crystallites within the grain interior upon annealing. © 2016 Acta Materialia Inc.

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Language(s): eng - English

Dates: Date issued: 2017-01-15

Publication Status: Issued

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Rev. Type: Peer

Identifiers: DOI: 10.1016/j.scriptamat.2016.09.021
BibTex Citekey: Mockute2017122

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Title: Scripta Materialia

Source Genre: Journal

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Publ. Info: Amsterdam : Elsevier B. V.

Pages: - Volume / Issue: 127 Sequence Number: - Start / End Page: 122 - 126 Identifier: ISSN: 1359-6462
CoNE: https://pure.mpg.de/cone/journals/resource/954926243506