Tailoring of the morphology and chemical composition of thin organosilane 
microwave plasma polymer layers on metal substrates

Grundmeier, G.; Thiemann, P.; Carpentier, J.; Shirtcliffe, N.; Stratmann, M.

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Tailoring of the morphology and chemical composition of thin organosilane microwave plasma polymer layers on metal substrates

Grundmeier, G., Thiemann, P., Carpentier, J., Shirtcliffe, N., & Stratmann, M. (2004). Tailoring of the morphology and chemical composition of thin organosilane microwave plasma polymer layers on metal substrates. Thin Solid Films, 446(1), 61-71.

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Datensatz-Permalink: https://hdl.handle.net/11858/00-001M-0000-0019-6667-9 Versions-Permalink: https://hdl.handle.net/11858/00-001M-0000-0019-6669-5

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Urheber:
Grundmeier, G.^{1, 2}, Autor
Thiemann, P.¹, Autor
Carpentier, J., Autor
Shirtcliffe, N.¹, Autor
Stratmann, M.³, Autor

Affiliations:
1Adhesion and Thin Films, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863349
2Christian Doppler Laboratory for Metal/Polymer Interfaces, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863353
3Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863348