English
 
Help Privacy Policy Disclaimer
  Advanced SearchBrowse

Item

ITEM ACTIONSEXPORT
 
 
DownloadE-Mail
 Local TagsRelease HistoryDetailsSummary
  The effect of Oxygen Reduction on the Self-Assembly and Stability of Thiol Monolayer Films

Rohwerder, M., & Stratmann, M. (2004). The effect of Oxygen Reduction on the Self-Assembly and Stability of Thiol Monolayer Films. Talk presented at 205th Meeting of the ECS. San Antonio, TX, USA. 2004-05-09 - 2004-05-14.

Item is

 

show all hide all

Basic

show hide
Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0019-653F-D Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0025-7477-0
Genre: Talk

Files

show Files

Locators

show

Creators

show
hide
 Creators:
Rohwerder, Michael1, Author           
Stratmann, Martin2, Author           
Affiliations:
1Molecular Structure and Surface Modification, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863360              
2Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863348              

Content

show
hide
Free keywords: Presenter: Rohwerder, M.
 Abstract: -

Details

show
hide
Language(s): eng - English
 Dates: 2004-05
 Publication Status: Not specified
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: -
 Identifiers: eDoc: 206600
 Degree: -

Event

show
hide
Title: 205th Meeting of the ECS
Place of Event: San Antonio, TX, USA
Start-/End Date: 2004-05-09 - 2004-05-14

Legal Case

show

Project information

show

Source

show