Temperature stability of thin anodic oxide films in metal/insulator/metal 
structures: A comparison between tantalum and aluminium oxide

Jeliazova, Y.; Kayser, M.; Mildner, B.; Hassel, A. W.; Diesing, D.

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Temperature stability of thin anodic oxide films in metal/insulator/metal structures: A comparison between tantalum and aluminium oxide

Jeliazova, Y., Kayser, M., Mildner, B., Hassel, A. W., & Diesing, D. (2006). Temperature stability of thin anodic oxide films in metal/insulator/metal structures: A comparison between tantalum and aluminium oxide. Thin Solid Films, 500, 330-335.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0019-5B5C-9 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0019-5B5E-5

Genre: Journal Article

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Jeliazova, Y., Author
Kayser, M., Author
Mildner, B., Author
Hassel, A. W.¹, Author
Diesing, D., Author

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1Electrochemistry and Corrosion, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863355

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Dates: Date issued: 2006

Publication Status: Issued

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Identifiers: eDoc: 251034

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Title: Thin Solid Films

Source Genre: Journal

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Pages: - Volume / Issue: 500 Sequence Number: - Start / End Page: 330 - 335 Identifier: -