Chemical structure and morphology of thin, organo-silicon plasma-polymer films 
as a function of process parameters

Shirtcliffe, N.; Thiemann, P.; Stratmann, M.; Grundmeier, G.

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Chemical structure and morphology of thin, organo-silicon plasma-polymer films as a function of process parameters

Shirtcliffe, N., Thiemann, P., Stratmann, M., & Grundmeier, G. (2001). Chemical structure and morphology of thin, organo-silicon plasma-polymer films as a function of process parameters. Surface & Coatings Technology, 142-144, 1121-1128.

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Datensatz-Permalink: https://hdl.handle.net/11858/00-001M-0000-0019-70C0-0 Versions-Permalink: https://hdl.handle.net/11858/00-001M-0000-0019-70C2-C

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Urheber:
Shirtcliffe, N.¹, Autor
Thiemann, P.¹, Autor
Stratmann, M.², Autor
Grundmeier, G.¹, Autor

Affiliations:
1Adhesion and Thin Films, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863349
2Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863348