ERRATUM: Infrared Analysis of Thin Films: Amorphous, Hydrogenated Carbon on Silicon

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ERRATUM: Infrared Analysis of Thin Films: Amorphous, Hydrogenated Carbon on Silicon

Jacob, W., von Keudell, A., & Schwarz-Selinger, T. (2001). ERRATUM: Infrared Analysis of Thin Films: Amorphous, Hydrogenated Carbon on Silicon. Brazilian Journal of Physics, 31, 109.

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Date of Discard: 2024-08-22

Comment: Zusammenfassung in einem Datensatz

Creators:
Jacob, W.^{1, 2}
von Keudell, A.^{1, 2}
Schwarz-Selinger, T.^{1, 2}

Affiliations:
1Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society, ou_2074325
2Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288

Dates: Date issued: 2001

Files: 0 Files

Locators: 0 Locators

version ID: item_2138720_1

Item State: Discarded

Name of Context: Import Context of the Max Planck Institute for Plasma Physics, Affiliated to: Max Planck Institute for Plasma Physics