Residual stress analysis in chemical-vapor-deposition diamond films

Liu, T.; Pinto, H.; Brito, P.; Sales, L. A.; Raabe, D.

doi:10.1063/1.3139083

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Residual stress analysis in chemical-vapor-deposition diamond films

Liu, T., Pinto, H., Brito, P., Sales, L. A., & Raabe, D. (2009). Residual stress analysis in chemical-vapor-deposition diamond films. Applied Physics Letters, 94(20): 201902 (3pp). doi:10.1063/1.3139083.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0019-4121-9 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0019-4123-5

Genre: Journal Article

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Creators:
Liu, T.¹, Author
Pinto, H.², Author
Brito, P.³, Author
Sales, L. A., Author
Raabe, D.⁴, Author

Affiliations:
1Microscopy and Diffraction, Microstructure Physics and Alloy Design, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863391
2Materials Testing, Material Diagnostics and Steel Technology, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863363
3External Organizations, ou_persistent22
4Microstructure Physics and Alloy Design, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863381

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Language(s): eng - English

Dates: Date issued: 2009-05-20

Publication Status: Issued

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Identifiers: eDoc: 430827
DOI: 10.1063/1.3139083
URI: http://link.aip.org/link/?APPLAB/94/201902/1

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Title: Applied Physics Letters

Alternative Title : Appl. Phys. Letters

Source Genre: Journal

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Pages: - Volume / Issue: 94 (20) Sequence Number: 201902 (3pp) Start / End Page: - Identifier: -