Microstructuring of Molecularly Thin Polymer Layers by Photolithography

Prucker, O.; Schimmel, M.; Tovar, G.; Knoll, Wolfgang; Rühe, Jürgen

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Microstructuring of Molecularly Thin Polymer Layers by Photolithography

Prucker, O., Schimmel, M., Tovar, G., Knoll, W., & Rühe, J. (1998). Microstructuring of Molecularly Thin Polymer Layers by Photolithography. Advanced Materials, 10, 1073-1077.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-000F-5658-4 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-000F-5659-2

Genre: Journal Article

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Creators:
Prucker, O.¹, Author
Schimmel, M., Author
Tovar, G., Author
Knoll, Wolfgang¹, Author
Rühe, Jürgen¹, Author

Affiliations:
1MPI for Polymer Research, Max Planck Society, ou_1309545

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Language(s): eng - English

Dates: Date issued: 1998

Publication Status: Issued

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Identifiers: eDoc: 359631
Other: P-98-140

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Title: Advanced Materials

Source Genre: Journal

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Pages: - Volume / Issue: 10 Sequence Number: - Start / End Page: 1073 - 1077 Identifier: -