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  Modification of thiol-derived self-assembling monolayers by electron and x-ray irradiation: Scientific and lithographic aspects

Zharnikov, M., & Grunze, M. (2002). Modification of thiol-derived self-assembling monolayers by electron and x-ray irradiation: Scientific and lithographic aspects. Journal of Vacuum Science and Technology B, 20(5), 1793-1807. doi:10.1116/1.1514665.

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Datensatz-Permalink: https://hdl.handle.net/21.11116/0000-0001-BE3A-9 Versions-Permalink: https://hdl.handle.net/21.11116/0000-0001-BE3B-8
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JVacuumSciTechnolB _20_2002_1793.pdf (beliebiger Volltext), 713KB
 
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 Urheber:
Zharnikov, M., Autor
Grunze, M.1, Autor           
Affiliations:
1Cellular Biophysics, Max Planck Institute for Medical Research, Max Planck Society, ou_2364731              

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 Zusammenfassung: This article reviews recent experiments on the modification of thiol-derived self-assembling monolayers (SAMs) by electron and x-ray irradiation. Several complementary experimental techniques such as near-edge x-ray absorption fine structure spectroscopy, x-ray photoelectron spectroscopy and microscopy, and infrared reflection absorption spectroscopy were applied to gain a detailed knowledge on the nature and extent of irradiation-induced damage in these systems. The reaction of a SAM to electron and x-ray irradiation was found to be determined by the interplay of the damage/decomposition and cross-linking processes. Ways to adjust the balance between these two opposing effects by molecular engineering of the SAM constituents are demonstrated. The presented data provide the physical–chemical basis for electron-beam patterning of self-assembled monolayers to extend lithography down to the nanometer scale.

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Sprache(n): eng - English
 Datum: 2002-08-232002-08-262002-10-042002
 Publikationsstatus: Erschienen
 Seiten: 15
 Ort, Verlag, Ausgabe: -
 Inhaltsverzeichnis: -
 Art der Begutachtung: Expertenbegutachtung
 Identifikatoren: DOI: 10.1116/1.1514665
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Titel: Journal of Vacuum Science and Technology B
  Andere : JVST B
  Andere : J. Vac. Sci. Techn. B
Genre der Quelle: Zeitschrift
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Ort, Verlag, Ausgabe: New York : Published by AVS through the American Institute of Physics
Seiten: - Band / Heft: 20 (5) Artikelnummer: - Start- / Endseite: 1793 - 1807 Identifikator: ISSN: 0734-2101
CoNE: https://pure.mpg.de/cone/journals/resource/954928495416