Chemical sputtering yields of carbon based materials at high ion flux densities

Grote, H.; Bohmeyer, W.; Kornejew, P.; Reiner, H. D.; Fussmann, G.; Schlöogl, R.; Weinberg, G.; Wu, C. H.

doi:10.1016/S0022-3115(98)00854-X

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Chemical sputtering yields of carbon based materials at high ion flux densities

Grote, H., Bohmeyer, W., Kornejew, P., Reiner, H. D., Fussmann, G., Schlöogl, R., et al. (1999). Chemical sputtering yields of carbon based materials at high ion flux densities. Journal of Nuclear Materials, 266-269, 1059-1064. doi:10.1016/S0022-3115(98)00854-X.

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Datensatz-Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-859A-E Versions-Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-EE94-C

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Urheber:
Grote, H.¹, Autor
Bohmeyer, W.², Autor
Kornejew, P.², Autor
Reiner, H. D.³, Autor
Fussmann, G.², Autor
Schlöogl, R.⁴, Autor
Weinberg, G.⁴, Autor
Wu, C. H.⁴, Autor

Affiliations:
1W7-X: Construction, Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856314
2Plasma Diagnostics Group (HUB), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856324
3Max Planck Society, ou_persistent13
4Fritz-Haber-Institut der Max-Planck Gesellschaft, Faradayweg 4, D-14195 Berlin, Germany; NET Team, Max-Planck-Institut für Plasmaphysik, EURATOM Association, Boltzmannstr. 2, D-85748 Garching, Germany, ou_persistent22

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Schlagwörter: 13th International Conference on Plasma Surface Interactions in Controlled Fusion Devices (PSI 13), San Diego, CA, 1998-05-18 to 1998-05-22

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