Hydrogen as an optimum reducing agent for metallization of self-assembled 
monolayers

Muglali, Mutlu Iskender; Bashir, Asif; Birkner, Alexander; Rohwerder, Michael

doi:10.1039/c2jm32111d

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Hydrogen as an optimum reducing agent for metallization of self-assembled monolayers

Muglali, M. I., Bashir, A., Birkner, A., & Rohwerder, M. (2012). Hydrogen as an optimum reducing agent for metallization of self-assembled monolayers. Journal of Materials Chemistry, 22(29), 14337-14340. doi:10.1039/c2jm32111d.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0019-2DF9-0 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0025-06D8-3

Genre: Journal Article

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Creators:
Muglali, Mutlu Iskender¹, Author
Bashir, Asif¹, Author
Birkner, Alexander², Author
Rohwerder, Michael¹, Author

Affiliations:
1Molecular Structure and Surface Modification, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863360
2Physical Chemistry i, Ruhr-University Bochum, D-44780 Bochum, Germany, ou_persistent22

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Language(s): eng - English

Dates: Date issued: 2012-08-07

Publication Status: Issued

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Identifiers: eDoc: 628018
DOI: 10.1039/c2jm32111d

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Title: Journal of Materials Chemistry

Source Genre: Journal

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Publ. Info: Cambridge, UK : Royal Society of Chemistry

Pages: - Volume / Issue: 22 (29) Sequence Number: - Start / End Page: 14337 - 14340 Identifier: ISSN: 0959-9428
CoNE: https://pure.mpg.de/cone/journals/resource/954925273429