In-situ transmission electron microscopy study of dislocations in a 
polycrystalline Cu thin film constrained by a substrate

Dehm, Gerhard; Arzt, Eduard

doi:10.1063/1.1289488

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In-situ transmission electron microscopy study of dislocations in a polycrystalline Cu thin film constrained by a substrate

Dehm, G., & Arzt, E. (2000). In-situ transmission electron microscopy study of dislocations in a polycrystalline Cu thin film constrained by a substrate. Applied Physics Letters, 77(8), 1126-1128. doi:10.1063/1.1289488.

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Item Permalink: https://hdl.handle.net/21.11116/0000-0001-966E-B Version Permalink: https://hdl.handle.net/21.11116/0000-0001-966F-A

Genre: Journal Article

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Creators:
Dehm, Gerhard¹, Author
Arzt, Eduard¹, Author

Affiliations:
1Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497655

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Free keywords: MPI für Metallforschung; Abt. Arzt;

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Language(s): eng - English

Dates: Date issued: 2000-08-21

Publication Status: Issued

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Rev. Type: Peer

Identifiers: eDoc: 43723
DOI: 10.1063/1.1289488

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Title: Applied Physics Letters

Abbreviation : Appl. Phys. Lett.

Source Genre: Journal

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Publ. Info: Melville, NY : American Institute of Physics

Pages: - Volume / Issue: 77 (8) Sequence Number: - Start / End Page: 1126 - 1128 Identifier: Other: 0003-6951
CoNE: https://pure.mpg.de/cone/journals/resource/954922836223