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  Self-assembly and crystallization behavior of mesoporous, crystalline HfO₂ thin films: A model system for the generation of mesostructured transition-metal oxides

Brezesinski, T., Smarsly, B., Iimura, K., Grosso, D., Boissiere, C., Amenitsch, H., et al. (2005). Self-assembly and crystallization behavior of mesoporous, crystalline HfO₂ thin films: A model system for the generation of mesostructured transition-metal oxides. Small, 1(8-9), 889-898. doi: 10.1002/smll.200500024.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0015-5D21-0 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-002A-C6AC-1
Genre: Journal Article

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1928567.pdf (Publisher version), 558KB
 
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 Creators:
Brezesinski, T.1, Author           
Smarsly, B.1, Author           
Iimura, K., Author
Grosso, D., Author
Boissiere, C., Author
Amenitsch, H., Author
Antonietti, M.2, Author           
Sanchez, C., Author
Affiliations:
1Kolloidchemie, Max Planck Institute of Colloids and Interfaces, Max Planck Society, ou_1863288              
2Markus Antonietti, Kolloidchemie, Max Planck Institute of Colloids and Interfaces, Max Planck Society, ou_1863321              

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Free keywords: mesoporous materials; self-assembly; sol-gel processes; thin film; X-ray scattering
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Language(s): eng - English
 Dates: 2005-08
 Publication Status: Issued
 Pages: -
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 Table of Contents: -
 Rev. Type: Peer
 Identifiers: eDoc: 256773
ISI: 000230909800022
DOI: 10.1002/smll.200500024
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Title: Small
  Other : Small
Source Genre: Journal
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Publ. Info: Weinheim, Germany : Wiley
Pages: - Volume / Issue: 1 (8-9) Sequence Number: - Start / End Page: 889 - 898 Identifier: ISSN: 1613-6810