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  Evaporation temperature-tuned physical vapor deposition growth engineering of one-dimensional non-Fermi liquid tetrathiofulvalene tetracyanoquinodimethane thin films

Sarkar, I., Laux, M., Demokritova, J., Ruffing, A., Mathias, S., Wei, J., et al. (2010). Evaporation temperature-tuned physical vapor deposition growth engineering of one-dimensional non-Fermi liquid tetrathiofulvalene tetracyanoquinodimethane thin films. Applied Physics Letters, 97(11): 111906, pp. 1-3. doi:10.1063/1.3489098.

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 Creators:
Sarkar, I.1, Author
Laux, M.1, Author
Demokritova, J.1, Author
Ruffing, A.1, Author
Mathias, S.1, Author
Wei, J.1, Author
Solovyeva, V.1, Author
Rudloff, M.1, Author
Naghavi, S. S.1, Author
Felser, C.2, Author           
Huth, M.1, Author
Aeschlimann, M.1, Author
Affiliations:
1external, ou_persistent22              
2External Organizations, ou_persistent22              

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 Abstract: We describe the growth of high quality tetrathiofulvalene tetracyanoquinodimethane (TTF-TCNQ) organic charge-transfer thin films which show a clear non-Fermi liquid behavior. Temperature dependent angle resolved photoemission spectroscopy and electronic structure calculations show that the growth of TTF-TCNQ films is accompanied by the unfavorable presence of neutral TTF and TCNQ molecules. The quality of the films can be controlled by tuning the evaporation temperature of the precursor in physical vapor deposition method. (C) 2010 American Institute of Physics. [doi:10.1063/1.3489098]

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 Dates: 2010-09-13
 Publication Status: Issued
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 Rev. Type: -
 Identifiers: ISI: 000282032900024
DOI: 10.1063/1.3489098
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Title: Applied Physics Letters
Source Genre: Journal
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Publ. Info: Melville, NY : American Institute of Physics
Pages: - Volume / Issue: 97 (11) Sequence Number: 111906 Start / End Page: 1 - 3 Identifier: Other: 0003-6951
CoNE: https://pure.mpg.de/cone/journals/resource/954922836223