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  High temperature chemical vapour deposition of silicon on Fe(100)

Rebhan, M. E., Meier, R., Plagge, A., Rohwerder, M., & Stratmann, M. (2001). High temperature chemical vapour deposition of silicon on Fe(100). Applied Surface Science, 178(1-4), 194-200. doi:10.1016/S0169-4332(01)00323-3.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0019-715C-A Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0025-1FA3-C
Genre: Journal Article

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 Creators:
Rebhan, Matthias Erwin1, 2, Author           
Meier, Roland1, 3, Author           
Plagge, Andreas1, Author           
Rohwerder, Michael1, 4, Author           
Stratmann, Martin2, 5, Author           
Affiliations:
1Institut für Werkstoffwissenschaften IV, Universität Erlangen, 91058 Erlangen, Germany, ou_persistent22              
2Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863348              
3Philips Analytical B.V., Lelyweg 1, NI-7602 EA Almelo, The Netherlands, ou_persistent22              
4Molecular Structure and Surface Modification, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863360              
5Institut für Werkstoffwissenschaften IV, Universität Erlangen, Erlangen, D-91058, Germany, ou_persistent22              

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Language(s): eng - English
 Dates: 2001-07-02
 Publication Status: Issued
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: -
 Identifiers: eDoc: 225226
DOI: 10.1016/S0169-4332(01)00323-3
 Degree: -

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Title: Applied Surface Science
Source Genre: Journal
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Affiliations:
Publ. Info: Amsterdam : Elsevier B.V.
Pages: - Volume / Issue: 178 (1-4) Sequence Number: - Start / End Page: 194 - 200 Identifier: ISSN: 0169-4332
CoNE: https://pure.mpg.de/cone/journals/resource/954928576736