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  Low-n mesoporous silica films: structure and properties

Konjhodzic, D., Bretinger, H., Wilczok, U., Dreier, A., Ladenburger, A., Schmidt, M., et al. (2005). Low-n mesoporous silica films: structure and properties. Applied Physics A-Materials Science & Processing, 81(2), 425-432. doi:10.1007/s00339-005-3244-y.

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 Creators:
Konjhodzic, D.1, Author           
Bretinger, H.1, Author           
Wilczok, U.2, Author           
Dreier, A.3, Author           
Ladenburger, A.4, Author
Schmidt, M.4, Author
Eich, M.4, Author
Marlow, F.1, Author           
Affiliations:
1Research Group Marlow, Max-Planck-Institut für Kohlenforschung, Max Planck Society, ou_1445612              
2Research Group Schmidt, Max-Planck-Institut für Kohlenforschung, Max Planck Society, ou_1445618              
3Service Department Lehmann (EMR), Max-Planck-Institut für Kohlenforschung, Max Planck Society, ou_1445625              
4Univ Ulm, Abt Halbleiterphys, D-89069 Ulm, Germany.; TU Hamburg Harburg, D-21073 Hamburg, Germany., ou_persistent22              

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Language(s): eng - English
 Dates: 2005
 Publication Status: Issued
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: eDoc: 265627
DOI: 10.1007/s00339-005-3244-y
ISI: 000229239800031
 Degree: -

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Title: Applied Physics A-Materials Science & Processing
  Alternative Title : Appl. Phys. A
Source Genre: Journal
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Publ. Info: -
Pages: - Volume / Issue: 81 (2) Sequence Number: - Start / End Page: 425 - 432 Identifier: ISSN: 0947-8396