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  Transmission electron microscopy study of erbium silicide formation from Ti/Er stack for Schottky contact applications

Ratajczak, J., Łaszcz, A., Czerwinski, A., Katcki, J., Phillipp, F., van Aken, P. A., et al. (2010). Transmission electron microscopy study of erbium silicide formation from Ti/Er stack for Schottky contact applications. Journal of Microscopy, 237(3), 379-383.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-3B64-A Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-3B66-6
Genre: Conference Paper

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 Creators:
Ratajczak, J.1, Author
Łaszcz, A.1, Author
Czerwinski, A.1, Author
Katcki, J.1, Author
Phillipp, F.2, Author           
van Aken, P. A.2, Author           
Reckinger, N.1, Author
Dupois, E.1, Author
Affiliations:
1Institute of Electron Technology, Al. Lotnik´ow 32/46, 02-668 Warsaw, Poland;Université catholique de Louvain, Place du Levant 3, 1348 Louvain-la-Neuve, Belgium;IEMN/ISEN, UMRS CNRS 8520, Avenue Poincare, Cite Scientifique, BP 69, 59652 Villeneuved’ Ascq Cedex, France., ou_persistent22              
2Stuttgart Center for Electron Microscopy, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497669              

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Free keywords: MPI für Metallforschung; Stuttgart Center for Electron Microscopy (StEM);
 Abstract: -

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Language(s): eng - English
 Dates: 2010
 Publication Status: Issued
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: eDoc: 458868
DOI: 10.1111/j.1365-2818.2009.03264.x
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Title: EM 2008 - XIII International Conference on Electron Microscopy
Place of Event: Zakopane, Poland
Start-/End Date: 2008-06-08 - 2008-06-11

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Title: Journal of Microscopy
Source Genre: Journal
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Publ. Info: -
Pages: - Volume / Issue: 237 (3) Sequence Number: - Start / End Page: 379 - 383 Identifier: -