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  Chemical sputtering of carbon films by argon ions and molecular oxygen at cryogenic temperatures

Hopf, C., Schlüter, M., & Jacob, W. (2007). Chemical sputtering of carbon films by argon ions and molecular oxygen at cryogenic temperatures. Applied Physics Letters, 90: 224106. Retrieved from http://scitation.aip.org/getabs/servlet/GetabsServlet?prog=normal&id=APPLAB000090000022224106000001&idtype=cvips&gifs=Yes.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-060C-9 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-060D-7
Genre: Journal Article

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 Creators:
Hopf, C.1, 2, Author           
Schlüter, M.3, Author           
Jacob, W.4, Author           
Affiliations:
1Experimental Plasma Physics 4 (E4), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856293              
2ITER Technology & Diagnostics (ITED), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856290              
3External Organizations, ou_persistent22              
4Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856328              

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Language(s): eng - English
 Dates: 2007
 Publication Status: Issued
 Pages: -
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 Table of Contents: -
 Rev. Type: Peer
 Identifiers: eDoc: 316571
URI: http://scitation.aip.org/getabs/servlet/GetabsServlet?prog=normal&id=APPLAB000090000022224106000001&idtype=cvips&gifs=Yes
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Title: Applied Physics Letters
Source Genre: Journal
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Publ. Info: American Institute of Physics
Pages: - Volume / Issue: 90 Sequence Number: 224106 Start / End Page: - Identifier: -