Plasma Processes and Film Deposition Using Tetraethoxysilane

Nöthe, M.; Bolt, H.

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Plasma Processes and Film Deposition Using Tetraethoxysilane

Nöthe, M., & Bolt, H. (2000). Plasma Processes and Film Deposition Using Tetraethoxysilane. Surface and Coatings Technology, 131, 102-108. Retrieved from http://www.sciencedirect.com/science?_ob=MImg&_imagekey=B6TVV-4281174-S-T&_cdi=5544&_user=100196&_orig=browse&_coverDate=09%2F01%2F2000&_sk=998689998&view=c&wchp=dGLbVzz-zSkWb&md5=15beac3bb6e76afcde9ea4733a3fb333&ie=/sdarticle.pdf.

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Datensatz-Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-5E8A-7 Versions-Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-5E8B-5

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Urheber:
Nöthe, M.¹, Autor
Bolt, H.², Autor

Affiliations:
1Forschungszentrum Jülich, Institute for Materials and Processes in Energy Systems, D-52425 Jülich, Germany, ou_persistent22
2Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856328