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  Relief Stylization from 3D Models using Featured Lines

Wang, M., Kerber, J., Chang, J., & Zhang, J. J. (2011). Relief Stylization from 3D Models using Featured Lines. In T. Nishita, & R. Durikovic (Eds.), Proceedings SCCG 2011 (pp. 37-42). New York, NY: ACM. doi:10.1145/2461217.2461226.

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Genre: Conference Paper
Latex : Relief Stylization from {3D} Models using Featured Lines

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Meili_Wang_SCCG_2011.pdf (Any fulltext), 468KB
 
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 Creators:
Wang, Meili1, Author
Kerber, Jens2, Author           
Chang, Jian1, Author
Zhang, Jian J1, Author
Affiliations:
1External Organizations, ou_persistent22              
2Computer Graphics, MPI for Informatics, Max Planck Society, ou_40047              

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 Abstract: Digital reliefs mimic the style of their real life counterparts, and hence offer an elegant depiction of a 3D shape. Despite an increasing amount of research on digital relief generation in computer graphics, little has been reported on the generation of abstract sculpture forms using pure engraved lines. In this paper, we present a method to create a relief-like sculpture using lines extracted from 3D Objects. Our relief generation process is different from other previous works: our method uses lines to present the geometric shape while others rely on the smooth surface to convey the shape information. Such a relief-like art piece can be easily machined since only the lines need to be carved.

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Language(s): eng - English
 Dates: 20112011
 Publication Status: Issued
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: -
 Identifiers: eDoc: 618873
BibTex Citekey: Wang_2011
DOI: 10.1145/2461217.2461226
 Degree: -

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Title: 27th Spring Conference on Computer Graphics
Place of Event: Viničné, Slovakia
Start-/End Date: 2011-04-28 - 2011-04-30

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Title: Proceedings SCCG 2011
  Subtitle : 27th Spring Conference on Computer Graphics ; Hotel Galbov Mlyn, Viničné, Slovak Republic, April 28 – 30, 2011
  Abbreviation : SCCG 2011
Source Genre: Proceedings
 Creator(s):
Nishita, Tomoyuki1, Editor
Durikovic, Roman1, Editor
Affiliations:
1 External Organizations, ou_persistent22            
Publ. Info: New York, NY : ACM
Pages: - Volume / Issue: - Sequence Number: - Start / End Page: 37 - 42 Identifier: ISBN: 978-1-4503-1978-2