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  Chemical sputtering of carbon by combined exposure to nitrogen ions and atomic hydrogen

Schlüter, M., Hopf, C., & Jacob, W. (2008). Chemical sputtering of carbon by combined exposure to nitrogen ions and atomic hydrogen. New Journal of Physics, 10: 053037 (17pp). Retrieved from http://dx.doi.org/10.1088/1367-2630/10/5/053037.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0026-FE63-6 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0026-FE78-7
Genre: Journal Article

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 Creators:
Schlüter, M.1, Author           
Hopf, C.2, Author           
Jacob, W.3, Author           
Affiliations:
1External Organizations, ou_persistent22              
2ITER Technology & Diagnostics (ITED), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856290              
3Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856328              

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Language(s): eng - English
 Dates: 2008
 Publication Status: Issued
 Pages: -
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 Table of Contents: -
 Rev. Type: Peer
 Identifiers: eDoc: 320885
URI: http://dx.doi.org/10.1088/1367-2630/10/5/053037
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Title: New Journal of Physics
  Alternative Title : New J. Phys.
Source Genre: Journal
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Publ. Info: IoP
Pages: - Volume / Issue: 10 Sequence Number: 053037 (17pp) Start / End Page: - Identifier: -