LOW temperature growth of gallium oxide thin films via plasma enhanced atomic 
layer deposition

O’Donoghue, Richard; Rechmann, Julian; Aghaee, Morteza; Rogalla, Detlef; Becker, Hans-Werner; Creatore, Mariadriana; Wieck, Andreas Dirk; Devi, Anjana

doi:10.1039/c7dt03427j

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LOW temperature growth of gallium oxide thin films via plasma enhanced atomic layer deposition

O’Donoghue, R., Rechmann, J., Aghaee, M., Rogalla, D., Becker, H.-W., Creatore, M., et al. (2017). LOW temperature growth of gallium oxide thin films via plasma enhanced atomic layer deposition. Dalton Transactions, 46, 16551-16561. doi:10.1039/c7dt03427j.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-002E-5426-0 Version Permalink: https://hdl.handle.net/21.11116/0000-0001-6546-F

Genre: Journal Article

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Creators:
O’Donoghue, Richard¹, Author
Rechmann, Julian², Author
Aghaee, Morteza³, Author
Rogalla, Detlef⁴, Author
Becker, Hans-Werner⁴, Author
Creatore, Mariadriana³, Author
Wieck, Andreas Dirk⁵, Author
Devi, Anjana⁶, Author

Affiliations:
1Inorganic Materials Chemistry, Faculty of Chemistry and Biochemistry, Ruhr-University Bochum, 44801 Bochum, Germany, ou_persistent22
2Interface Spectroscopy, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863358
3Eindhoven University of Technology, 5612 AZ Eindhoven, The Netherlands, persistent22
4RUBION, Ruhr University Bochum, 44801 Bochum, Germany, ou_persistent22
5Chair for Applied Solid State Physics, Ruhr-Universität Bochum, 44801 Bochum, Germany, ou_persistent22
6Inorganic Materials Chemistry, Ruhr-University Bochum, Universitätsstr. 150, Germany, ou_persistent22

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Language(s): eng - English

Dates: Accepted: 2017-11-11Date issued: 2017-11-21

Publication Status: Issued

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Rev. Type: Peer

Identifiers: DOI: 10.1039/c7dt03427j

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Title: Dalton Transactions

Abbreviation : Dalton Trans.

Source Genre: Journal

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Publ. Info: Cambridge, UK : Royal Society of Chemistry

Pages: - Volume / Issue: 46 Sequence Number: - Start / End Page: 16551 - 16561 Identifier: ISSN: 1477-9226
CoNE: https://pure.mpg.de/cone/journals/resource/954925269323