Advances in sputter depth profiling using AES

Hofmann, S.

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Advances in sputter depth profiling using AES

Hofmann, S. (2003). Advances in sputter depth profiling using AES. Surface and Interface Analysis, 35(7), 556-563.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-2C85-8 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-2C86-6

Genre: Journal Article

Alternative Title : Surf. Interface Anal.

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331.pdf (Abstract), 6KB

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Creators:
Hofmann, S.¹, Author

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1Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497644

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Free keywords: MPI für Metallforschung; Abt. Mittemeijer; AES, sputter depth profiling, MRI model, diffusion measurement

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Language(s): eng - English

Dates: Date issued: 2003-07

Publication Status: Issued

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Rev. Type: Peer

Identifiers: eDoc: 112077
ISI: 000184687500002

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Title: Surface and Interface Analysis

Alternative Title : Surf. Interface Anal.

Source Genre: Journal

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Pages: - Volume / Issue: 35 (7) Sequence Number: - Start / End Page: 556 - 563 Identifier: ISSN: 0142-2421