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  Selectable nanopattern arrays for nanolithographic imprint and etch-mask applications

Jeong, H.-H., Mark, A. G., Lee, T.-C., Son, K., Chen, W., Alarcón-Correa, M., et al. (2015). Selectable nanopattern arrays for nanolithographic imprint and etch-mask applications. Advanced Science, 2(7): 1500016, pp. 1-7. doi:10.1002/advs.201500016.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0029-BF2A-2 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-002E-7E9A-4
Genre: Journal Article

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AdvSci_2_2015_1500016.pdf (Any fulltext), 2MB
 
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http://onlinelibrary.wiley.com/doi/10.1002/advs.201500016/epdf (Any fulltext)
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 Creators:
Jeong, Hyeon-Ho, Author
Mark, Andrew G., Author
Lee, Tung-Chun, Author
Son, Kwanghyo, Author
Chen, Wenwen1, Author           
Alarcón-Correa, Mariana, Author
Kim, Insook, Author
Schütz, Gisela, Author
Fischer, Peer, Author
Affiliations:
1Cellular Biophysics, Max Planck Institute for Medical Research, Max Planck Society, ou_2364731              

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Free keywords: block copolymer micelle nanolithography; glancing angle deposition; nanoimprint lithography; nanoparticle lithography; shadow growth physical vapor deposition
 Abstract: A parallel nanolithographic patterning method is presented that can be used to obtain arrays of multifunctional nanoparticles. These patterns can simply be converted into a variety of secondary nanopatterns that are useful for nanolithographic imprint, plasmonic, and etch-mask applications.

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Language(s): eng - English
 Dates: 2015-04-072015-01-262015-05-062015-07-01
 Publication Status: Issued
 Pages: 7
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: DOI: 10.1002/advs.201500016
URI: https://www.ncbi.nlm.nih.gov/pubmed/27980957
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Title: Advanced Science
  Other : Adv. Sci.
Source Genre: Journal
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Publ. Info: Weinheim : Wiley-VCH
Pages: - Volume / Issue: 2 (7) Sequence Number: 1500016 Start / End Page: 1 - 7 Identifier: Other: 2198-3844
CoNE: https://pure.mpg.de/cone/journals/resource/2198-3844