Lithography-free approaches to patterned multilayers based on wrinkling

Fery, A.; Böker, A.; Hanske, C.; Horn, A.; Lu, C. H.; Pretzl, M.; Schweikart, A.

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Lithography-free approaches to patterned multilayers based on wrinkling

Fery, A., Böker, A., Hanske, C., Horn, A., Lu, C. H., Pretzl, M., et al. (2008). Lithography-free approaches to patterned multilayers based on wrinkling. Abstracts of Papers of the American Chemical Society, 236: 86-PMSE.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0015-52E2-7 Version Permalink: https://hdl.handle.net/21.11116/0000-0007-540E-C

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Creators:
Fery, A., Author
Böker, A., Author
Hanske, C., Author
Horn, A., Author
Lu, C. H.¹, Author
Pretzl, M., Author
Schweikart, A., Author

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1Grenzflächen, Max Planck Institute of Colloids and Interfaces, Max Planck Society, ou_1863287

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Language(s): eng - English

Dates: Date issued: 2008

Publication Status: Issued

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Identifiers: eDoc: 456362
ISI: 000270280001144

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Title: Abstracts of Papers of the American Chemical Society

Alternative Title : Abstr. Pap. Am. Chem. Soc.

Source Genre: Journal

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Pages: - Volume / Issue: 236 Sequence Number: 86-PMSE Start / End Page: - Identifier: ISSN: 0065-7727