Antireflective subwavelength structures on microlens arrays—comparison of 
various manufacturing techniques

Pacholski, Claudia; Morhard, Christoph; Spatz, Joachim P.; Lehr, Dennis; Schulze, Marcel; Kley, Ernst-Bernhard; Tünnermann, Andreas; Helgert, Michael; Sundermann, Michael; Brunner, Robert

doi:10.1364/AO.51.000008

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Antireflective subwavelength structures on microlens arrays—comparison of various manufacturing techniques

Pacholski, C., Morhard, C., Spatz, J. P., Lehr, D., Schulze, M., Kley, E.-B., et al. (2012). Antireflective subwavelength structures on microlens arrays—comparison of various manufacturing techniques. Applied Optics, 51(1), 8-14. doi:10.1364/AO.51.000008.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-4AFE-C Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-4AFF-A

Genre: Journal Article

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Creators:
Pacholski, Claudia¹, Author
Morhard, Christoph¹, Author
Spatz, Joachim P.¹, Author
Lehr, Dennis², Author
Schulze, Marcel², Author
Kley, Ernst-Bernhard², Author
Tünnermann, Andreas², Author
Helgert, Michael², Author
Sundermann, Michael², Author
Brunner, Robert², Author

Affiliations:
1Dept. New Materials and Biosystems, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497649
2Biophysikalische Chemie, Universität Heidelberg. INF 253, 69120 Heidelberg; Friedrich-Schiller-Universität Jena, 07743 Jena; Carl Zeiss Jena GmbH, Technologie Zentrum, 07745 Jena; Carl Zeiss Jena GmbH, Technologie Zentrum, 73447 Oberkochen; FH Jena, 07745 Jena, ou_persistent22

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Free keywords: MPI für Intelligente Systeme; Abt. Spatz;

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Language(s): eng - English

Dates: Date issued: 2012

Publication Status: Issued

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Rev. Type: Peer

Identifiers: eDoc: 575724
DOI: 10.1364/AO.51.000008

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Title: Applied Optics

Source Genre: Journal

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Pages: - Volume / Issue: 51 (1) Sequence Number: - Start / End Page: 8 - 14 Identifier: -