Influence of a direct current bias on the energy of ions from an electron 
cyclotron resonance plasma

Reinke, P.; Schelz, S.; Jacob, W.; Möller, W.

doi:10.1116/1.578167

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Influence of a direct current bias on the energy of ions from an electron cyclotron resonance plasma

Reinke, P., Schelz, S., Jacob, W., & Möller, W. (1992). Influence of a direct current bias on the energy of ions from an electron cyclotron resonance plasma. Journal of Vacuum Science and Technology A: Vacuum Surfaces and Films, 10(3), 434-438. doi:10.1116/1.578167.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-94F0-D Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-94F1-B

Genre: Journal Article

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Creators:
Reinke, P.¹, Author
Schelz, S.², Author
Jacob, W.³, Author
Möller, W.³, Author

Affiliations:
1External Organizations, ou_persistent22
2Max Planck Society, ou_persistent13
3Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288

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Language(s): eng - English

Dates: Date issued: 1992

Publication Status: Issued

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Rev. Type: Peer

Identifiers: eDoc: 661127
DOI: 10.1116/1.578167
URI: http://avspublications.org/jvsta/resource/1/jvtad6/v10/i3/p434_s1

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Title: Journal of Vacuum Science and Technology A: Vacuum Surfaces and Films

Source Genre: Journal

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Pages: - Volume / Issue: 10 (3) Sequence Number: - Start / End Page: 434 - 438 Identifier: -