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  Microcontact-Printing-Assisted Access of Graphitic Carbon Nitride Films with Favorable Textures toward Photoelectrochemical Application

Liu, J., Wang, H., Chen, Z., Möhwald, H., Fiechter, S., van de Krol, R., et al. (2015). Microcontact-Printing-Assisted Access of Graphitic Carbon Nitride Films with Favorable Textures toward Photoelectrochemical Application. Advanced Materials, 27(4), 712-718. doi:10.1002/adma.201404543.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0025-06C9-5 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0025-06CA-3
Genre: Journal Article

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2096538.pdf (Publisher version), 2MB
 
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2096538_supp.pdf (Supplementary material), 459KB
 
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 Creators:
Liu, Jian1, Author           
Wang, Hongqiang2, Author           
Chen, Zupeng3, Author           
Möhwald, Helmuth2, Author           
Fiechter, Sebastian4, Author
van de Krol, Roel4, Author
Wen, Liping4, Author
Jiang, Lei4, Author
Antonietti, Markus1, Author           
Affiliations:
1Markus Antonietti, Kolloidchemie, Max Planck Institute of Colloids and Interfaces, Max Planck Society, ou_1863321              
2Helmuth Möhwald, Grenzflächen, Max Planck Institute of Colloids and Interfaces, Max Planck Society, ou_1863312              
3Dariya Dontsova, Kolloidchemie, Max Planck Institute of Colloids and Interfaces, Max Planck Society, ou_1933288              
4external, ou_persistent22              

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 Dates: 2015-01-27
 Publication Status: Issued
 Pages: -
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 Table of Contents: -
 Rev. Type: -
 Identifiers: DOI: 10.1002/adma.201404543
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Title: Advanced Materials
  Other : Adv. Mater.
Source Genre: Journal
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Publ. Info: Weinheim : Wiley VCH
Pages: - Volume / Issue: 27 (4) Sequence Number: - Start / End Page: 712 - 718 Identifier: ISSN: 0935-9648
CoNE: https://pure.mpg.de/cone/journals/resource/954925570855