Tailoring the stress-depth profile in thin films; the case of γ’-Fe4N1-x

Wohlschlögel, M.; Welzel, U.; Mittemeijer, E. J.

doi:10.1016/j.tsf.2011.07.070

Local TagsRelease HistoryDetailsSummary

Tailoring the stress-depth profile in thin films; the case of γ’-Fe₄N_1-x

Wohlschlögel, M., Welzel, U., & Mittemeijer, E. J. (2011). Tailoring the stress-depth profile in thin films; the case of γ’-Fe₄N_1-x. Thin Solid Films, 520, 287-293. doi:10.1016/j.tsf.2011.07.070.

Item is Released

show all hide all

Basic

show hide

Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-4EAE-2 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-4EAF-F

Genre: Journal Article

Files

show Files

Locators

show

Creators

show

hide

Creators:
Wohlschlögel, M.¹, Author
Welzel, U.¹, Author
Mittemeijer, E. J.^{1, 2}, Author

Affiliations:
1Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497644
2Universität Stuttgart, Institut für Materialwissenschaft, ou_persistent22

Content

show

hide

Free keywords: MPI für Intelligente Systeme; Abt. Mittemeijer;

Abstract: -

Details

show

hide

Language(s): eng - English

Dates: Date issued: 2011

Publication Status: Issued

Pages: -

Publishing info: -

Table of Contents: -

Rev. Type: Peer

Identifiers: eDoc: 579761
DOI: 10.1016/j.tsf.2011.07.070

Degree: -

Event

show

Legal Case

show

Project information

show

Source 1

show

hide

Title: Thin Solid Films

Source Genre: Journal

Creator(s):

Affiliations:

Publ. Info: -

Pages: - Volume / Issue: 520 Sequence Number: - Start / End Page: 287 - 293 Identifier: -