On the Mechanism of Ion Transport in Thin (1-100 nm) Oxide Films on Aluminum 
and Tantalum

Hassel, A. W.; Lohrengel, M. M.; Rüße, S.; Schultze, J. W.

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On the Mechanism of Ion Transport in Thin (1-100 nm) Oxide Films on Aluminum and Tantalum

Hassel, A. W., Lohrengel, M. M., Rüße, S., & Schultze, J. W. (1994). On the Mechanism of Ion Transport in Thin (1-100 nm) Oxide Films on Aluminum and Tantalum. Bulletin of the Chemists and Technologists of Macedonia, 13, 49-54.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0019-7492-5 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0019-7494-1

Genre: Journal Article

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Creators:
Hassel, A. W.¹, Author
Lohrengel, M. M., Author
Rüße, S., Author
Schultze, J. W., Author

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1External Organizations, ou_persistent22

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Language(s): eng - English

Dates: Date issued: 1994

Publication Status: Issued

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Identifiers: eDoc: 230135

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Title: Bulletin of the Chemists and Technologists of Macedonia

Alternative Title : Bull. Chem. Technol. Maced.

Source Genre: Journal

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Pages: - Volume / Issue: 13 Sequence Number: - Start / End Page: 49 - 54 Identifier: -