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  Strain mapping for advanced CMOS technologies

Özdöl, V. B., Tyutyunnikov, D., Koch, C. T., & van Aken, P. A. (2014). Strain mapping for advanced CMOS technologies. Crystal Research and Technology, 49(1), 38-42. doi:10.1002/crat.201300226.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0015-87FD-4 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0015-8871-5
Genre: Journal Article

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 Creators:
Özdöl, V. B.1, Author
Tyutyunnikov, D.2, Author           
Koch, C. T.3, Author
van Aken, P. A.2, Author           
Affiliations:
1National Center for Electron Microscopy, Lawrence Berkeley National Laboratory, One Cyclotron Road, MS 72, Berkeley, CA, 94720, USA, ou_persistent22              
2Stuttgart Center for Electron Microscopy, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497669              
3Institute for Experimental Physics, Ulm University, Albert- Einstein-Allee 11, D-89081, Ulm, Germany, ou_persistent22              

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Free keywords: StEM
 Abstract: -

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Language(s): eng - English
 Dates: 2014-01-152014
 Publication Status: Issued
 Pages: 5
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: DOI: 10.1002/crat.201300226
 Degree: -

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Title: Crystal Research and Technology
Source Genre: Journal
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Publ. Info: Berlin, Fed. Rep. of Germany : Wiley-VCH
Pages: - Volume / Issue: 49 (1) Sequence Number: - Start / End Page: 38 - 42 Identifier: ISSN: 0232-1300
CoNE: https://pure.mpg.de/cone/journals/resource/954928496432