Growth kinetics and mechanisms of aluminium-oxide films formed by thermal 
oxidation of aluminum

Jeurgens, L. P. H.; Sloof, W. G.; Tichelaar, F. D.; Mittemeijer, E. J.

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Growth kinetics and mechanisms of aluminium-oxide films formed by thermal oxidation of aluminum

Jeurgens, L. P. H., Sloof, W. G., Tichelaar, F. D., & Mittemeijer, E. J. (2002). Growth kinetics and mechanisms of aluminium-oxide films formed by thermal oxidation of aluminum. Journal of Applied Physics, 92, 1649-1656.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-3324-F Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-3325-D

Genre: Journal Article

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Creators:
Jeurgens, L. P. H.¹, Author
Sloof, W. G., Author
Tichelaar, F. D., Author
Mittemeijer, E. J.^{1, 2}, Author

Affiliations:
1Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497644
2Universität Stuttgart, Institut für Materialwissenschaft, ou_persistent22

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Free keywords: MPI für Metallforschung; Abt. Mittemeijer; 28-mi_2002;

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Language(s): eng - English

Dates: Date issued: 2002

Publication Status: Issued

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Rev. Type: Peer

Identifiers: eDoc: 13374
ISI: 000176089000017

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Title: Journal of Applied Physics

Source Genre: Journal

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Pages: - Volume / Issue: 92 Sequence Number: - Start / End Page: 1649 - 1656 Identifier: ISSN: 0039-6028