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  Feature Sensitive Bas Relief Generation

Kerber, J., Tevs, A., Zayer, R., Belyaev, A., & Seidel, H.-P. (2009). Feature Sensitive Bas Relief Generation. In J.-H. Yong, M. Spagnuolo, & W. Wang (Eds.), IEEE International Conference on Shape Modeling and Applications Proceedings (pp. 148-154). Washington, USA: IEEE Computer Society Press.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-000F-19AD-0 Version Permalink: https://hdl.handle.net/21.11116/0000-000F-5846-0
Genre: Conference Paper

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 Creators:
Kerber, Jens1, Author           
Tevs, Art1, 2, Author           
Zayer, Rhaleb1, Author           
Belyaev, Alexander1, Author           
Seidel, Hans-Peter1, Author                 
Affiliations:
1Computer Graphics, MPI for Informatics, Max Planck Society, ou_40047              
2International Max Planck Research School, MPI for Informatics, Max Planck Society, ou_1116551              

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 Abstract: Among all forms of sculpture, bas-relief is arguably the closest to painting.
Although inherently a two dimensional sculpture, a bas-relief suggests a visual
spatial extension of the scene in depth through the combination of composition,
perspective, and shading. Most recently, there have been significant results on
digital bas-relief generation but many of the existing techniques may wash out
high level surface detail during the compression process. The primary goal of
this work is to address the problem of fine features by tailoring a filtering
technique that achieves good compression without compromising the quality of
surface details. As a secondary application we explore the generation of
artistic relief which mimic cubism in painting and we show how it could be used
for generating Picasso like portraits.

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Language(s): eng - English
 Dates: 2009-09-212009
 Publication Status: Issued
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: -
 Identifiers: eDoc: 520477
URI: http://www.mpi-inf.mpg.de/~kerber/publications/Jens_Kerber_SMI_2009.pdf
Other: Local-ID: C125675300671F7B-8F2AFB7CFC9176DFC12575F6003BAF29-Kerber_SMI2009
BibTex Citekey: Kerber-et-al_SMI08
DOI: 10.1109/SMI.2009.5170176
 Degree: -

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Title: 2009 IEEE International Conference on Shape Modeling and Applications
Place of Event: Beijing, China
Start-/End Date: 2009-06-26 - 2009-06-28

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Title: IEEE International Conference on Shape Modeling and Applications Proceedings
Source Genre: Proceedings
 Creator(s):
Yong, Jun-Hai1, Editor
Spagnuolo, Michela1, Editor
Wang, Wenping1, Editor
Affiliations:
1 External Organizations, ou_persistent22            
Publ. Info: Washington, USA : IEEE Computer Society Press
Pages: - Volume / Issue: - Sequence Number: - Start / End Page: 148 - 154 Identifier: ISBN: 978-1-4244-4068-9