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  Microstructuring of Molecularly Thin Polymer Layers by Photolithography

Prucker, O., Schimmel, M., Tovar, G., Knoll, W., & Rühe, J. (1998). Microstructuring of Molecularly Thin Polymer Layers by Photolithography. Advanced Materials, 10, 1073-1077.

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 Creators:
Prucker, O.1, Author              
Schimmel, M., Author
Tovar, G., Author
Knoll, Wolfgang1, Author              
Rühe, Jürgen1, Author              
Affiliations:
1MPI for Polymer Research, Max Planck Society, ou_1309545              

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Language(s): eng - English
 Dates: 1998
 Publication Status: Published in print
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: -
 Identifiers: eDoc: 359631
Other: P-98-140
 Degree: -

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Title: Advanced Materials
Source Genre: Journal
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Affiliations:
Publ. Info: -
Pages: - Volume / Issue: 10 Sequence Number: - Start / End Page: 1073 - 1077 Identifier: -