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  Surface modification with orthogonal photosensitive silanes for sequential chemical lithography and site-selective particle deposition

del Campo, A., Boos, D., Spiess, H. W., & Jonas, U. (2005). Surface modification with orthogonal photosensitive silanes for sequential chemical lithography and site-selective particle deposition. Angewandte Chemie International Edition, 44(30), 4707-4712. doi:10.1002/anie.200500092.

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 Creators:
del Campo, A.1, Author           
Boos, D.1, Author           
Spiess, Hans Wolfgang1, Author           
Jonas, Ulrich1, Author           
Affiliations:
1MPI for Polymer Research, Max Planck Society, ou_1309545              

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Language(s): eng - English
 Dates: 2005
 Publication Status: Issued
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: -
 Identifiers: eDoc: 238013
Other: P-05-234
DOI: 10.1002/anie.200500092
 Degree: -

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Title: Angewandte Chemie International Edition
  Other : Angewandte Chemie, International Edition
  Abbreviation : Angew. Chem. Int. Ed.
Source Genre: Journal
 Creator(s):
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Publ. Info: Weinheim : Wiley-VCH
Pages: - Volume / Issue: 44 (30) Sequence Number: - Start / End Page: 4707 - 4712 Identifier: ISSN: 1433-7851
CoNE: https://pure.mpg.de/cone/journals/resource/1433-7851