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  A study on the metal-organic CVD of pure copper films from low cost copper(II) dialkylamino-2-propoxides: Tuning the thermal properties of the precursor by small variations of the ligand

Becker, R., Devi, A., Weiss, J., Weckenmann, U., Winter, M., Kiener, C., et al. (2003). A study on the metal-organic CVD of pure copper films from low cost copper(II) dialkylamino-2-propoxides: Tuning the thermal properties of the precursor by small variations of the ligand. Chemical Vapor Deposition, 9(3), 149-156. doi:10.1002/cvde.200306236.

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 Creators:
Becker, R.1, Author
Devi, A.1, Author
Weiss, J.1, Author
Weckenmann, U.1, Author
Winter, M.2, Author              
Kiener, C.3, Author              
Becker, H. W.1, Author
Fischer, R. A.1, Author
Affiliations:
1Ruhr Univ Bochum, Lehrstuhl Anorgan Chem 2, D-44780 Bochum, Germany.; Ruhr Univ Bochum, Lehrstuhl Expt Phys 3, D-44780 Bochum, Germany., ou_persistent22              
2Research Department Fink, Max-Planck-Institut für Kohlenforschung, Max Planck Society, ou_1445583              
3Research Department Schüth, Max-Planck-Institut für Kohlenforschung, Max Planck Society, ou_1445589              

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Free keywords: amino alkoxides, copper, MOCVD, thermal analysis, thin films
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Language(s): eng - English
 Dates: 2003-06
 Publication Status: Published in print
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: eDoc: 116962
DOI: 10.1002/cvde.200306236
ISI: 000183972400007
 Degree: -

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Title: Chemical Vapor Deposition
  Alternative Title : Chem. Vapor Depos.
Source Genre: Journal
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Publ. Info: -
Pages: - Volume / Issue: 9 (3) Sequence Number: - Start / End Page: 149 - 156 Identifier: ISSN: 0948-1907