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  Quantitative evaluation of sputtering induced surface roughness in depth profiling of polycrystalline multilayers using auger electron spectroscopy

Wang, J. Y., Hofmann, S., Zalar, A., & Mittemeijer, E. J. (2003). Quantitative evaluation of sputtering induced surface roughness in depth profiling of polycrystalline multilayers using auger electron spectroscopy. Thin Solid Films, 444, 120-124.

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Item Permalink: http://hdl.handle.net/11858/00-001M-0000-0010-2F04-5 Version Permalink: http://hdl.handle.net/11858/00-001M-0000-0010-2F05-3
Genre: Journal Article

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 Creators:
Wang, J. Y.1, Author              
Hofmann, S.1, Author              
Zalar, A., Author
Mittemeijer, E. J.1, 2, Author              
Affiliations:
1Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497644              
2Universität Stuttgart, Institut für Materialwissenschaft, ou_persistent22              

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Free keywords: MPI für Metallforschung; Abt. Mittemeijer;
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Language(s): eng - English
 Dates: 2003
 Publication Status: Published in print
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 Identifiers: eDoc: 114061
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Title: Thin Solid Films
Source Genre: Journal
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Pages: - Volume / Issue: 444 Sequence Number: - Start / End Page: 120 - 124 Identifier: -