Materials analysis with monolayer depth resolution using MeV ion beams

Carstanjen, H. D.

Local TagsRelease HistoryDetailsSummary

Materials analysis with monolayer depth resolution using MeV ion beams

Carstanjen, H. D. (2001). Materials analysis with monolayer depth resolution using MeV ion beams. Journal of Materials Processing Technology, 117(Special Volume): (CD-ROM).

Item is Released

show all hide all

Basic

show hide

Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-3429-C Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-342A-A

Genre: Conference Paper

Files

show Files

Locators

show

Creators

show

hide

Creators:
Carstanjen, H. D.^{1, 2}, Author

Affiliations:
1Former Central Scientific Facility Pelletron Accelerator, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497653
2Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497648

Content

show

hide

Free keywords: MPI für Metallforschung; Abt. Schütz;

Abstract: -

Details

show

hide

Language(s): eng - English

Dates: Date issued: 2001-10

Publication Status: Issued

Pages: -

Publishing info: -

Table of Contents: -

Rev. Type: -

Identifiers: eDoc: 200515

Degree: -

Event

show

hide

Title: International Conference on Processing & Manufacturing of Advanced Materials, THERMEC 2000

Place of Event: Las Vegas, USA

Start-/End Date: 2000-12-04 - 2000-12-08

Legal Case

show

Project information

show

Source 1

show

hide

Title: Journal of Materials Processing Technology

Source Genre: Journal

Creator(s):

Affiliations:

Publ. Info: -

Pages: - Volume / Issue: 117 (Special Volume) Sequence Number: (CD-ROM) Start / End Page: - Identifier: -