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  Microstructural evolution of ion-bombarded copper thin films

Wagner, T., & Müller, D. (2000). Microstructural evolution of ion-bombarded copper thin films. In S. Moss (Ed.), Fundamental Mechanisms of Low-Energy-Beam-Modified Surface Growth and Processing (pp. 85-90). Warrendale/PA: Materials Research Society.

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 Creators:
Wagner, T.1, Author              
Müller, D., Author
Affiliations:
1Central Scientific Facility Thin Film Laboratory, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497640              

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Free keywords: MPI für Metallforschung; Abt. Arzt;
 Abstract: -

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Language(s): eng - English
 Dates: 2000
 Publication Status: Published in print
 Pages: -
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 Table of Contents: -
 Rev. Type: -
 Identifiers: eDoc: 210869
 Degree: -

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Title: Fundamental Mechanisms of Low-Energy-Beam-Modified Surface Growth and Processing. Symposium
Place of Event: Boston, Mass
Start-/End Date: 1999-11-29 - 1999-12-01

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Title: Fundamental Mechanisms of Low-Energy-Beam-Modified Surface Growth and Processing
Source Genre: Proceedings
 Creator(s):
Moss, S., Editor
Affiliations:
-
Publ. Info: Warrendale/PA : Materials Research Society
Pages: - Volume / Issue: - Sequence Number: - Start / End Page: 85 - 90 Identifier: -

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Title: Materials Research Society Symposium Proceedings
Source Genre: Series
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Publ. Info: -
Pages: - Volume / Issue: 585 Sequence Number: - Start / End Page: - Identifier: -